Chemical Vapor Deposition

Chemical Vapor Deposition or CVD uses a chemical process to produce high purity films. In the process a silicon wafer is flooded with precursors which react on the surface to produce the film. Examples of the CVD process include hot wall thermal CVD and plasma-assisted CVD. Unlike the PVD process, the CVD process can be used at atmospheric pressure as well as under vacuum. This process is used most frequently in the integrated circuits industry.


Special coatings may require a special application method to do the job right. To help you determine the best application method for your product/project, please contact us.

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